DeForest, William S. <br/><br/>
Photoresist :  Materials and Processes / 
W.S. DeForest. 
 - New York :  McGraw-Hill Book Company,  1975. 
 - 269 p. :  fig., tables. 
<br/><br/>Includes Bibliographical References and Index. 
<br/><br/><label>ISBN: </label>0-07-016230-1 
<br/><br/><label>Subjects--Topical Terms: </label><br/>Integrated Circuits<br/>Electronics