X-Ray Diffraction at Elevated Temperatures :  A Method for In Situ Proces Analysis / 
D.D.L. Chung et al. 
 - New York ;  Weinheim :  VCH Publishers, Inc.,  1993. 
 - 268 p. :  fig. 
<br/><br/>Includes Bibliographical References and Index. 
<br/><br/><label>ISBN: </label>0-89573-745-0 3-527-27842-7 
<br/><br/><label>Subjects--Topical Terms: </label><br/>Crystallography